NDLI: The Influence of Cleaning on SiO Growth

Content Provider	IEEE Xplore Digital Library
Author	Wiget, R. Ryssel, H. Aderhold, W.
Copyright Year	1989
Description	Author affiliation: Fraunhofer-Arbeitsgruppe für Integrierte Schaltungen, Artilleriestrasse 12, 8520 Erlangen, FRG; Lehrstuhl für Elektronische Bauelemente, Artilleriestrasse 12, 8520 Erlangen, FRG (Ryssel, H.) \|\| Fraunhofer-Arbeitsgruppe für Integrierte Schaltungen, Artilleriestrasse 12, 8520 Erlangen, FRG (Wiget, R.) \|\| Lehrstuhl für Elektronische Bauelemente, Artilleriestrasse 12, 8520 Erlangen, FRG (Aderhold, W.)
Abstract	The oxidation rate of single crystalline silicon depends on the preoxidation cleaning procedure. Various cleaning procedures were compared using aqueous solutions of NH, HCl-H and H· A dip in 10% HF was used either at the beginning or at the end of the cleaning procedure. Thermal oxidation was carried out at 885°C, 985°C and 1085°C in a conventional diffusion furnace. The oxidation rates are maximum for the samples treated with HF as a final step in the cleaning procedure whereas a final treatment with NHOH leads to a minimum oxidation rate. ESCA measurements were performed to investigate the chemical state of the SiO-Si interface. The oxide contains more silicon after HF etching than after NHOH etching.
Starting Page	370
Ending Page	373
File Size	1049361
Page Count	4
File Format	PDF
ISBN	0387510001
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1989-09-11
Publisher Place	Germany
Access Restriction	Subscribed
Rights Holder	Springer-Verlag Heidelberg
Subject Keyword	Cleaning Oxidation Hafnium Silicon Etching Temperature Kinetic theory Performance evaluation Furnaces Chemicals
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Preoxidation cleaning optimization for crystalline silicon (solar cell manufacture)

Silicon clean impact on 90nm CMOS devices performance

Morphological features of nanostructured silicon obtained by metal-assisted chemical etching

Growth modes and characterization of thin RTP silicon oxides

Dry etching process using XeF2 on microhotplate device

A new modified HF-last cleaning process for high-performance gate dielectrics

Optimization of surface preparation for direct silicon-silicon bonding

Photolumineseence In Porous Silicon

Development of a high sensitivity anhydride hexafluorhydric acid sensor

The Influence of Cleaning on SiO Growth

Similar Documents

Preoxidation cleaning optimization for crystalline silicon (solar cell manufacture)

Silicon clean impact on 90nm CMOS devices performance

Morphological features of nanostructured silicon obtained by metal-assisted chemical etching

Growth modes and characterization of thin RTP silicon oxides

Dry etching process using XeF2 on microhotplate device

A new modified HF-last cleaning process for high-performance gate dielectrics

Optimization of surface preparation for direct silicon-silicon bonding

Photolumineseence In Porous Silicon

Development of a high sensitivity anhydride hexafluorhydric acid sensor

The Influence of Cleaning on SiO Growth