NDLI: Film-induced stress in substrate/film structure

Content Provider	IEEE Xplore Digital Library
Author	Hancheng Liang Shounan Zhao Ganming Qin Chin, K.K.
Copyright Year	1995
Description	Author affiliation: Dept. of Electr. & Comput. Eng., New Jersey Inst. of Technol., Newark, NJ, USA (Hancheng Liang)
Abstract	Most all microelectronic devices have the basic material structure of a semiconductor substrate with thin films on it. The thin film layer and its discontinuity will give rise to stress fields in both the semiconductor substrate and the thin film. We investigate the stress in such film/substrate structures by using the photoelastic method. Compared with other stress measurement technologies, the photoelastic method is a distinctive method. It can offer the real-time qualitative observation as well as the quantitative determination of stress distribution in a sample. Under a polarized light field, birefringence patterns are obtained in a semiconductor substrate when it is stressed. By analyzing the polarization information added by the stressed crystal region, the stress distribution in the substrate may be extracted. According to the principle of static force balance, the stress introduced into the thin film can be estimated by investigating the stress integral of the substrate.
Starting Page	272
Ending Page	274
File Size	180407
Page Count	3
File Format	PDF
ISBN	0780330625
DOI	10.1109/ICSICT.1995.500084
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-10-24
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Substrates Semiconductor thin films Semiconductor films Photoelasticity Optical polarization Microelectronics Semiconductor materials Thin film devices Stress measurement Birefringence
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Thin film multi-material OEICs

Residual and Induced Birefringence Measurement of ITO-Coated PET Substrate by Photoelastic Method

Transverse electrooptic properties of antiferroelectric lead containing thin films

PLZT thin film optical waveguide devices

Nonlithographic semiconductor nanoscale devices

A novel approach to study patterned thin film local stress for microelectronics application

Polarization dependence of photoinduced birefringence in chalcogenide thin film

Thin Film Resonators and Filters

Experimental determination of thin film adhesion using 4 point bending specimen

Film-induced stress in substrate/film structure

Similar Documents

Thin film multi-material OEICs

Residual and Induced Birefringence Measurement of ITO-Coated PET Substrate by Photoelastic Method

Transverse electrooptic properties of antiferroelectric lead containing thin films

PLZT thin film optical waveguide devices

Nonlithographic semiconductor nanoscale devices

A novel approach to study patterned thin film local stress for microelectronics application

Polarization dependence of photoinduced birefringence in chalcogenide thin film

Thin Film Resonators and Filters

Experimental determination of thin film adhesion using 4 point bending specimen

Film-induced stress in substrate/film structure