NDLI: Deposition of Titanium dioxide (TiO) thin films using in-house Nano-TiO Powder

Content Provider	IEEE Xplore Digital Library
Author	Sahdan, M.Z. Alias, M.S. Nafarizal, N. Hashim, U.
Copyright Year	2012
Description	Author affiliation: Microelectronic and Nanotechnology-Shamsuddin Research Centre, Faculty of Electrical and Electronic Engineering, Universiti Tun Hussein Onn Malaysia, 86400 Batu Pahat, Johor, Malaysia (Sahdan, M.Z.; Alias, M.S.; Nafarizal, N.) \|\| Institut Nano-Engineering, Universiti Malaysia Perlis, 01000 Kangar, Perlis, Malaysia (Hashim, U.)
Abstract	The purpose of this study is to fabricate uniform TiO2 thin films using in-house TiO2 nanopowder. The nanopowder was obtained from a tin mining waste (Ilmenite) and its concentration was optimized during fabrication. The TiO2 thin films were characterized by an atomic force microscope (AFM), a surface profiler, an X-ray diffractometer, an Ultra violet- Visible (UV-Vis) and a current-voltage (I-V) measurement system. The relation of the uniformity and the properties of the TiO2 thin films will be discussed in detail in this paper.
Starting Page	267
Ending Page	270
File Size	918639
Page Count	4
File Format	PDF
ISBN	9781467323956
e-ISBN	9781467323963
e-ISBN	9781467323949
DOI	10.1109/SMElec.2012.6417138
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-09-19
Publisher Place	Malaysia
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Powders Optical device fabrication Optical films Atomic measurements Titanium Optical refraction atomic force microscope (AFM) Titanium dioxide (TiO2) ilmenite thin films solgel
Content Type	Text
Resource Type	Article

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