NDLI: Facile construction of crystalline films by atmospheric non-thermal plasma chemical vapor deposition

Content Provider	IEEE Xplore Digital Library
Author	Wang, D.X. Yang, Q.Y. Guo, Y. Ding, K. Shi, Y.C. Shi, J.J. Zhang, J.
Copyright Year	2012
Description	Author affiliation: Department of Applied Physics, College of Sciences, Donghua University, 2999 Renming Road(n), Shanghai, 201620, China (Wang, D.X.; Yang, Q.Y.; Guo, Y.; Ding, K.; Shi, Y.C.; Shi, J.J.; Zhang, J.)
Abstract	Summary form only given. 3D micro/nano structured crystalline films designed appropriately with tunable crystal lattice, defect level, size, morphology or architecture are highly desirable for scientific and technical applications, especially in photocatalysts for the production of electric energy and hydrogen and for chemical degradation. Other interesting photo, electro, maganetic, chemical, phototonic and cytokine effects could also be expected. In this presentation, atmospheric pressure non-thermal plasma chemical vapor deposition (APCVD) without any templates and catalysts has been applied to tailor the morphology and crystalline structure of the deposited films. A Si/SiOx nanoparticle-linked network film structure has been obtained by a near atmospheric plasma-enhanced chemical vapor deposition modulated through a bias voltage. The porosity and oxidation of this nanoparticle-linked network film and the intensity of its photoluminescence spectrum at 410 nm were observed to increase with the bias voltage. A 3D anatase TiO single crystal sheet-connected film with two exposed {001} crystal facets and a high concentration of oxygen defects has been constructed for the first time by a self-confined deposition process of an atmospheric non-thermal reactive plasma of TiCl/O2/Ar. Such 3D anatase TiO single crystal sheet-connected films display an observable strong white photoluminescence comparable to commercial fluorescent lamp interior coatings. The reactive species, the substrate self-heating, the nanoparticle coagulation and crystallization were greatly influenced by the power frequency and the bias voltage. This simple and rapid plasma deposition opened an effective and economic way to construct various 3D crystalline films with low cost and large scale‥
File Size	137735
File Format	PDF
ISBN	9781457721274
ISSN	07309244
e-ISBN	9781457721298
e-ISBN	9781457721281
DOI	10.1109/PLASMA.2012.6383878
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-07-08
Publisher Place	United Kingdom
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Films Plasmas Crystals Chemical vapor deposition Morphology Chemicals Nanostructures
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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