NDLI: Simulation study of stochastic heating in dual frequency capacitively coupled plasma discharges

Content Provider	IEEE Xplore Digital Library
Author	Sharma, S. Turner, M.
Copyright Year	2012
Description	Author affiliation: National Centre for Plasma Science and Technology, Dublin City University, Dublin 9, Ireland (Sharma, S.; Turner, M.)
Abstract	Summary form only given. Capacitively coupled plasma discharges that are driven by two frequencies have been of interest in recent years because the low frequency source can control the sheath voltage and the mean ion bombarding energy while the high frequency source can sustain the plasma and control the ion flux. Thus the independent control of ion energy and ion flux is the motivation of dual frequency discharges. An analytical model for dual frequency case to study stochastic heating is given by Kawamura et $al.^{1}$ and has been investigated here using particle-in-cell simulation. Benchmarking of this analytical model has been done by Kawamura et al. using particle-in-cell simulation but the data points are rather small. Turner and Chabert $^{2}$ developed an alternative model to study stochastic heating using fluid equations for dual-frequency capacitive discharges.
File Size	90872
File Format	PDF
ISBN	9781457721274
ISSN	07309244
e-ISBN	9781457721298
e-ISBN	9781457721281
DOI	10.1109/PLASMA.2012.6383809
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-07-08
Publisher Place	United Kingdom
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Discharges (electric) Heating Frequency control Plasmas Analytical models Mathematical model Stochastic processes
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Condensed Matter Physics Electrical and Electronic Engineering

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