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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Yukimura, K. Ego, K. Imai, T. Levchenko, I. Takaki, K. Suda, Y. |
| Copyright Year | 2006 |
| Description | Author affiliation: Dept. of Electr. Eng., Doshisha Univ., Kyoto (Yukimura, K.; Ego, K.; Imai, T.) |
| Abstract | Summary form only given. A carbon shunting arc discharge triggers a burst-type hydro-carbon RF (192 kHz) plasma, which causes a mixed state of carbon species from both plasmas. The hybrid plasma is advantageous due to the following: (1) pressure range of RF plasma generation is expanded, which leads to enhancing the deposition rate of the prepared films, (2) both hydrogen content controllable amorphous carbon films and metal-contained carbon films are prepared, and (3) reactive depositions, e.g., nitrogen-containing carbon films may be efficiently prepared. Thus, a variety of carbon related films are promising to be prepared. Considering these backgrounds, a hybrid plasma combining the carbon shunting arc discharge with a burst RF (192 kHz) plasma is generated to prepare amorphous carbon films. In the present research, a target with a diameter of 60 mm is immersed in the hybrid plasma. The RF plasma source is positioned at the upper side of the target, and the target is positioned at the same height of the shunting arc discharge. By using the shunting arc discharge plasma, a dynamic pressure range capable to generate the RF plasma is expanded and the deposition rate is enhanced. It is found that in a hybrid plasma consisting of nitrogen RF plasma and carbon shunting arc plasma the C-N bonding is generated in addition to C-C bonding. When the target position from the shunting arc source is varied from 150-300 mm, the structure of the prepared film changed from a diamond-like carbon (DLC) to a glassy carbon film. For a short distance of the target from the shunting arc source, a DLC film is prepared, while for a long distance, a glassy carbon is prepared. This suggests that the ions contribute to the film preparation. Thus, it is confirmed that the hybrid plasma can control not only the gaseous contents in the prepared film, but also the structure of the amorphous state |
| Sponsorship | Plasma Sci. and Applications Comm. IEEE Nuclear and Plasma Sci. Soc |
| Starting Page | 245 |
| Ending Page | 245 |
| File Size | 136732 |
| Page Count | 1 |
| File Format | |
| ISBN | 1424401259 |
| DOI | 10.1109/PLASMA.2006.1707117 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2006-06-04 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Amorphous materials Radio frequency Plasma properties Arc discharges Plasma sources Hybrid power systems Bonding Diamond-like carbon Hydrogen Pressure control |
| Content Type | Text |
| Resource Type | Article |
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