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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Aranchuk, L.E. Larour, J. |
| Copyright Year | 2006 |
| Description | Author affiliation: Ecole Polytech., Palaiseau (Aranchuk, L.E.; Larour, J.) |
| Abstract | Summary form only given. X-pinch plasmas are point-like X-ray sources with potential application for backlighting diagnostic in the keV range. A very compact LC generator (40 kV, 200 kA) has been used for driving X-pinches made of 18-25 mum diameter Cu, Mo and W wires with a current rise time of 200 ns. A series of XRD and silicon p-i-n detectors with various filters were used to study their X-ray spectra in the range 20 eV-10 keV. Time resolved spectral analysis allows us to assume some stages of X-pinch process. The first stage deals with plasma load preparation, while XUV radiation spectrum is below 400 eV. Its total radiation power is $(5-10)times10^{7}$ W during ~125 ns before the main peak. It yields a total energy ~5-10 J. Then, 3-5 ns preceding the main peak one can observe plasma heating accompanied by emission increasing in the range 200-400 eV, but without appreciable value in the harder region >400 eV. Here, the total power is about (2-4)times10 $^{8}$ W. The main peak power is estimated to be a little bit higher than 1 TW with 20-35% in the E>900 eV photon energy range. Its FWHM is 0.4-0.7 ns in the energy region higher than 1 keV. At last, an emission tail with a specific times about 75-100 ns is composed of XUV radiation softer than 400 eV. Here, the radiation power varies at the range $(1-4)times10^{8}$ W. A few humps with FWHW 6-20 ns are very often observed on the radiation tail |
| Sponsorship | Plasma Sci. and Applications Comm. IEEE Nuclear and Plasma Sci. Soc |
| Starting Page | 254 |
| Ending Page | 254 |
| File Size | 111358 |
| Page Count | 1 |
| File Format | |
| ISBN | 1424401259 |
| DOI | 10.1109/PLASMA.2006.1707126 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2006-06-04 |
| Publisher Place | USA |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Plasma x-ray sources Plasma applications Plasma diagnostics Plasma sources Tail Wires X-ray scattering Silicon PIN photodiodes X-ray detection |
| Content Type | Text |
| Resource Type | Article |
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