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Content Provider | IEEE Xplore Digital Library |
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Author | Lammel, G. Renaud, P. |
Copyright Year | 2000 |
Description | Author affiliation: Inst. of Microsyst., Swiss Fed. Inst. of Technol., Lausanne, Switzerland (Lammel, G.) |
Abstract | This paper reports a new fabrication method for a microactuated tunable optical filter based on porous silicon formation followed by electropolishing. This surface micromachining process generates in a single step a multilayered optical interference filter, releases it from the substrate and lifts it out of plane. The filter can be tilted by a thermal bimorph actuator in order to tune the wavelength it transmits or reflects. The fabrication process uses only two photolithography levels on ordinary silicon p/sup +/ substrates. Large, flat, actuatable flip-up Bragg mirrors of porous silicon have been realized with a typical thickness of 30 /spl mu/m and areas ranging from 250 by 750 /spl mu/m to 2400 by 4000 /spl mu/m. Their capability to distinguish light sources with a wavelength separation of less than 20 nm in the visible is presented. |
Starting Page | 132 |
Ending Page | 137 |
File Size | 524288 |
Page Count | 6 |
File Format | |
ISBN | 0780352734 |
ISSN | 10846999 |
DOI | 10.1109/MEMSYS.2000.838503 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2000-01-27 |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Silicon Actuators Optical filters Optical device fabrication Optical surface waves Micromachining Interference Lithography Mirrors Light sources |
Content Type | Text |
Resource Type | Article |
Subject | Condensed Matter Physics Electronic, Optical and Magnetic Materials Mechanical Engineering Electrical and Electronic Engineering |
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