NDLI: N-well based CMOS calorimetric chemical sensors

Content Provider	IEEE Xplore Digital Library
Author	Kerness, N. Koll, A. Schaufelbuhl, A. Hagleitner, C. Hierlemann, A. Brand, O. Baltes, H.
Copyright Year	2000
Description	Author affiliation: Phys. Electron. Lab., Eidgenossische Tech. Hochschule, Zurich, Switzerland (Kerness, N.)
Abstract	New micromachined calorimetric chemical sensors based on an n-well island structure have been designed, fabricated in industrial CMOS technology, and tested. The suspended island structure is covered with a polymer and changes its temperature upon absorption or desorption of analyte. The temperature change is recorded by integrated polysilicon/aluminum thermopiles. A polysilicon or metal heating resistor covers the n-well structure which allows a more accurate calibration compared to our previous design . The system provides a physical sensitivity of 34 and 26.5 mV//spl mu/W for the square and rectangular shaped membrane devices, respectively. Sensitivity and performance of the calorimetric chemical microsystem are shown by measurements for different volatile organic compounds. The system has a sensitivity of 0.045 and 0.049 mV/ppm to ethanol and 0.209 and 0.229 mV/ppm to toluene for the square and rectangular membrane devices, respectively.
Starting Page	96
Ending Page	101
File Size	642048
Page Count	6
File Format	PDF
ISBN	0780352734
ISSN	10846999
DOI	10.1109/MEMSYS.2000.838497
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2000-01-27
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Chemical sensors CMOS technology Temperature sensors Biomembranes Chemical industry Textile industry Chemical technology Testing Polymers Absorption
Content Type	Text
Resource Type	Article
Subject	Condensed Matter Physics Electronic, Optical and Magnetic Materials Mechanical Engineering Electrical and Electronic Engineering

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