NDLI: The selection of chemicals in CMP slurry via electrochemical screening

Content Provider	IEEE Xplore Digital Library
Author	Wei, Te-Yu Guevenc, Haci Osman Leunissen, Leonardus H.A.
Copyright Year	2014
Description	Author affiliation: BASF Taiwan Ltd, 32853 Taoyuan, Taiwan, R.O.C (Wei, Te-Yu) \|\| BASF, 67056, Ludwigshafen, Germany (Guevenc, Haci Osman; Leunissen, Leonardus H.A.)
Abstract	Corrosion is an important issue during chemical mechanical polishing (CMP). The surface protection should be considered during CMP and also after CMP post cleaning step. There are several parameters have an impact on corrosion of metal surfaces during CMP such as chelating agent (AC), corrosion inhibitor (I) and pH. Electrochemical behavior of cobalt, copper and tantalum are investigated for different type of chelating agent, corrosion inhibitor at various concentrations. It is observed that the presence of a specific AC at low pH value shows the best corrosion protection on cobalt, copper and tantalum surface based on the same concentration conditions. Moreover, corrosion inhibition with I02 was obtained to be better than I01 on cobalt and tantalum, but I02 was worse on copper. The galvanic corrosion behavior between cobalt and copper to tantalum were also demonstrated in this article. AC1 and I02 chelating agent-corrosion inhibitor couple were found to have good performance of galvanic corrosion performance.
Starting Page	229
Ending Page	232
File Size	99931
Page Count	4
File Format	PDF
ISBN	9781479955565
e-ISBN	9781479955572
DOI	10.1109/ICPT.2014.7017286
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-11-19
Publisher Place	Japan
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Corrosion inhibitors Corrosion Copper Cobalt Slurries Chemicals
Content Type	Text
Resource Type	Article

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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