NDLI: Multiaxis Maglev nanopositioner for precision manufacturing and manipulation applications

Content Provider	IEEE Xplore Digital Library
Author	Verma, S. Kim, W.-J. Shakir, H.
Copyright Year	2004
Description	Author affiliation: Dept. of Mech. Eng., Texas A&M Univ., College Station, TX, USA (Verma, S.)
Abstract	We present a 6-axis magnetic levitation (Maglev) stage capable of precision positioning down to several nanometers. This stage has a simple and compact mechanical structure advantageous to meet the performance requirements in the next-generation nanomanufacturing. It uses the minimum number of linear actuators required to generate all 6-axis motions. Three vertical actuators are used to levitate the moving part, namely the platen, and maintain its vertical position. Other three horizontal actuators control its position and rotation in the horizontal plane. We describe the electromechanical design, modeling and control, and the electronic instrumentation to control this maglev system. We modeled the platen as a pure mass due to negligible spring and damping forces while it is levitated without contact. The stage has a light moving-part mass of 0.2126 kg. It is capable of generating translation of 300 /spl mu/m in the x-, y- and z-axes, and rotation of 3 mrad about the three orthogonal axes. The stage demonstrates position resolution better than 5 nm rms and position noise less than 2 nm rms. The total power consumption by all the actuators is only a fraction of a watt. Experimental results presented in this paper show that the stage can carry, orient, and precisely position a payload as heavy as 0.3 kg. The pull-out force was found to be 8.08 N in the vertical direction. Furthermore, under the effect of a load variation of 0.14 N, the plant recovers its regulated position within 0.6 s. All these experimental results match quite closely with the calculated values because of the accurate plant model and robust controller design. This device can be used as a positioning stage for numerous applications including photolithography for semiconductor manufacturing, microscopic scanning of delicate instruments, fabrication and assembly of nanostructures, and microscale rapid prototyping.
Starting Page	2084
Ending Page	2091
File Size	564181
Page Count	8
File Format	PDF
ISBN	0780384865
ISSN	01972618
DOI	10.1109/IAS.2004.1348754
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-10-03
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Damping Semiconductor device noise Energy consumption Nanopositioning Instruments Hydraulic actuators Control system synthesis Manufacturing Springs Magnetic levitation
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Control and Systems Engineering Electrical and Electronic Engineering

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1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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