NDLI: Sidewall Smoothing for Si/SiO2 Waveguides by Excimer Laser Reformation

Content Provider	IEEE Xplore Digital Library
Author	Shih-Che Hung Eih-Zhe Liang Ching-Fuh Lin
Copyright Year	2007
Description	Author affiliation: Nat. Taiwan Univ., Taipei (Shih-Che Hung)
Abstract	$Si/SiO_{2}$ waveguides are applicable to modern silicon nano-photonics and are compatible with Si electronics for compact integration. However, for the submicron-scale waveguides, surface roughness sensitively affects the scattering loss and then causes an impediment to use. Many efforts are devoted to reducing the scattering loss by minimizing the roughness of the sidewalls, including hydrogen annealing, dry oxidation, and wet chemical etching. These methods, however, have several drawbacks. The two methods using high temperature have concerns on the thermal budgets and the capability of oxidation method to reduce a large roughness is limited. Here, we demonstrate the fabrication of smooth Si waveguides by laser reformation. This technique has no limitation on thermal budgets in integration of electronics and photonics if protective coatings are used to prevent exposure of the electronics during laser illumination. The process to smooth as-etched Si waveguides is quite simple. The waveguides are illuminated by 248nm homogenized KrF excimer laser with pulse duration of 25ns. During the illumination process, waveguides are placed in a vacuum chamber.
Starting Page	1
Ending Page	1
File Size	424590
Page Count	1
File Format	PDF
ISBN	9781424409303
DOI	10.1109/CLEOE-IQEC.2007.4386517
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2007-06-17
Publisher Place	Germany
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Smoothing methods Surface waves Electromagnetic scattering Lighting Waveguide lasers Particle scattering Oxidation Silicon Surface roughness Rough surfaces
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in