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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Kinugawa, M. Kakumu, M. |
| Copyright Year | 1993 |
| Description | Author affiliation: Semicond. Device Eng. Lab., Toshiba Corp., Kawasaki, Japan (Kinugawa, M.; Kakumu, M.) |
| Abstract | In this paper, a guideline for optimum embedded memory structures for advanced MPUs and other memory-embedded logic devices is proposed. It is concluded that introduction of full CMOS cells is inevitable for future SRAMs operated under reduced power supply voltage conditions. Therefore, MPUs will continue to use full CMOS cells maintaining excellent process and transistor design compatibility with SRAMs. On the other hand, some advanced logic devices will use DRAM cells, since they require higher density rather than higher performance or better process compatibility.< |
| Starting Page | 37 |
| Ending Page | 40 |
| File Size | 311109 |
| Page Count | 4 |
| File Format | |
| ISBN | 0780314506 |
| ISSN | 01631918 |
| DOI | 10.1109/IEDM.1993.347404 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 1993-12-05 |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Logic devices Threshold voltage Process design Random access memory Power supplies Guidelines Driver circuits Thin film transistors Virtual manufacturing Semiconductor devices |
| Content Type | Text |
| Resource Type | Article |
| Subject | Materials Chemistry Electronic, Optical and Magnetic Materials Condensed Matter Physics Electrical and Electronic Engineering |
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