NDLI: New high transparent resist and process technology for KrF excimer laser lithography

Content Provider	IEEE Xplore Digital Library
Author	Sasago, M. Endo, M. Tani, Y. Nakagawa, H. Hirai, Y. Nomura, N.
Copyright Year	1988
Description	Author affiliation: Matsushita Electr. Ind. Co. Ltd., Osaka, Japan (Sasago, M.; Endo, M.; Tani, Y.; Nakagawa, H.; Hirai, Y.; Nomura, N.)
Abstract	Novel, very simplified, high-aspect-ratio, single-layer resist materials and process technology for KrF excimer laser lithography have been developed. They consist of a negative resist, a positive resist, and a surface treatment process called HARD (high-aspect-ratio resist pattern fabrication by alkaline surface disposal). Both the negative and positive resists are composed of an alkaline-soluble styrene polymer as the highly transparent main polymer. The HARD process differs from the conventional process only in the addition of an alkaline treatment of the resist surface before exposure. High-aspect-ratio resist patterns with a large focus latitude were obtained using this simple method. It is concluded that these techniques are an effective and simple way to fabricate deep-submicron-design-rule VLSIs.<>
Starting Page	88
Ending Page	91
File Size	514417
Page Count	4
File Format	PDF
ISSN	01631918
DOI	10.1109/IEDM.1988.32758
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1988-12-11
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Resists Lithography Polymers Semiconductor lasers Surface treatment Very large scale integration Resins Optical materials Optical device fabrication Photobleaching
Content Type	Text
Resource Type	Article
Subject	Materials Chemistry Electronic, Optical and Magnetic Materials Condensed Matter Physics Electrical and Electronic Engineering

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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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