NDLI: Magnetron discharge with azimuthally nonuniform cathode

Content Provider	IEEE Xplore Digital Library
Author	Elistratov, N.G. Zimin, A.M.
Copyright Year	2000
Description	Author affiliation: Moscow State Tech. Univ., Russia (Elistratov, N.G.)
Abstract	The paper presents results of discharge characteristics studies in crossed E-H fields of a planar magnetron filled with deuterium and using different materials of the cathode-target whose secondary ion-electron emission coefficients differ essentially. It was found that both voltages at which discharge takes place and current-voltage relation (CVR) modes differ substantially for beryllium and tungsten. In the case of beryllium cathode, the discharge voltage is relatively small and varies depending on mode of operation very weakly over a wide range of condition changes. The CVR of a discharge with a tungsten cathode, on the contrary, is "classic"-the discharge voltage is considerably higher and substantially depends on external parameters. The results of magnetron discharges studies with a composite cathode incorporating sectors made of different materials are being presented as well. The authors note that an azimuthal drift in the crossed fields results in an efficient "mixing" of emission electrons knocked-on from different target materials. As a result, the discharge with such an azimuthally nonuniform cathode has a characteristic similar to that recorded for beryllium cathode. The dynamics of CVR modification was studied too. Relative re-deposition of sputtered target atoms was revealed experimentally, and a theoretical interpretation of this effect was carried out using the so-called function of virtual source of thermalized target atoms.
Starting Page	723
Ending Page	726
File Size	339893
Page Count	4
File Format	PDF
ISBN	0780357914
DOI	10.1109/DEIV.2000.879090
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2000-09-18
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Cathodes Magnetic materials Voltage Magnetic flux Plasma materials processing Deuterium Tungsten Sputtering Plasma applications Plasma sources
Content Type	Text
Resource Type	Article

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