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Cathode voltage and discharge current oscillations in HiPIMS
| Content Provider | Scilit |
|---|---|
| Author | Klein, P. Hnilica, J. Hubička, Z. Čada, M. Šlapanská, M. Zemánek, M. Vašina, P. |
| Copyright Year | 2017 |
| Description | Journal: Plasma Sources Science and Technology The paper reports on the oscillations both on the cathode voltage and on the discharge current which emerged suddenly and simultaneously during the high power impulse magnetron sputtering pulse. Thoroughgoing experiments identified the pressure and the discharge current ranges to detect these oscillations. The oscillations were originating from the magnetized plasma and their frequency ranged from 225 kHz to 400 kHz depending on the experimental conditions. Simultaneous measurement of both oscillations and spokes was conducted to find mutual correlations. The oscillations always accompanied the spokes and no particular conditions to detect oscillations at spoke absence were found. The oscillations were not caused by the rotational motion of the spokes but they emerged when the certain threshold amount of spokes was overreached. |
| Related Links | http://iopscience.iop.org/article/10.1088/1361-6595/aa62ee/pdf |
| ISSN | 09630252 |
| e-ISSN | 13616595 |
| DOI | 10.1088/1361-6595/aa62ee |
| Journal | Plasma Sources Science and Technology |
| Issue Number | 5 |
| Volume Number | 26 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 2017-04-04 |
| Access Restriction | Open |
| Subject Keyword | Journal: Plasma Sources Science and Technology Nuclear Energy and Engineering Discharge Current Cathode Voltage Magnetron Sputtering Current Oscillations |
| Content Type | Text |
| Resource Type | Article |
| Subject | Condensed Matter Physics |
