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Content Provider | IEEE Xplore Digital Library |
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Author | Hyun Sung Joo Atwater, H.A. |
Copyright Year | 1965 |
Abstract | We have investigated magnetoresistance properties of (100) epitaxial, (111) textured and polycrystalline spin valve heterostructures on (100) Si substrates by UHV ion beam sputtering at room temperature. Magnetoresistance was measured as a function of Cu interlayer thickness (t/sub i/) with 10 /spl Aring//spl les/t/sub i//spl les/100 /spl Aring/ and the maximum was found at 20 /spl Aring/ in the case of (100) epitaxial spin valves. Highly (111) textured spin valves with heterostructure configurations similar to (100) spin valves were found to have a slightly lower magnetoresistance than (100) heterostructures, but a very similar functional dependence of magnetoresistance on t/sub i/. Interface mixing during the sputtering process by energetic neutral bombardment was found to significantly affect the magnetoresistance. Samples were made under various sputtering conditions (gas pressure, ion beam energy, target and substrate configuration) that could enhance or suppress high energy neutral bombardment of the growing film surface. Samples made under the conditions that suppressed neutral bombardment showed higher magnetoresistance and more abrupt interfaces as confirmed by small angle X-ray diffraction (SAXD) analysis of interface mixing by energetic neutral bombardment during sputter deposition. |
Sponsorship | IEEE Magnetics Society |
Starting Page | 3946 |
Ending Page | 3948 |
Page Count | 3 |
File Size | 339468 |
File Format | |
ISSN | 00189464 |
Volume Number | 31 |
Issue Number | 6 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 1995-11-01 |
Publisher Place | U.S.A. |
Access Restriction | One Nation One Subscription (ONOS) |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Magnetoresistance Spin valves Sputtering Substrates Ion beams Magnetic properties Thickness measurement Temperature measurement X-ray diffraction Magnetic analysis |
Content Type | Text |
Resource Type | Article |
Subject | Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering |
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