NDLI: Sputtered Mn-Al-Cu films for magnetic recording media

Content Provider	IEEE Xplore Digital Library
Author	Morisako, A. Matsumoto, M. Naoe, M.
Copyright Year	1965
Abstract	Ferromagnetic τ phase of Mn-Al-Cu films have been prepared by dc magnetron sputtering and their crystallographic characteristics, magnetic properties and recording characteristics have been investigated. In binary Mn-Al films, the stability of τ phase is very poor and saturation magnetization Ms as low as about 120 emu/cc. To improve the stabilty of this phase and increase the Ms, Mn was partially substituted by Cu. Ms increased from 120 to 300 emu/cc with increase in Cu content of up to 23 at%. Coercivity Hc decreased with increase of Cu content in the films. τ and κ phase were synthesized at Cu content below 10 at% and above this content, respectively. MnAlCu thin film sputtered disks have been prepared and their recording characteristics have been investigated. Typical recording density D50of MnAlCu disk was 59 kfrpi.
Sponsorship	IEEE Magnetics Society
Starting Page	2470
Ending Page	2472
Page Count	3
File Size	361124
File Format	PDF
ISSN	00189464
Volume Number	23
Issue Number	5
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1987-09-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Magnetic films Magnetic recording Sputtering Magnetic properties Substrates Saturation magnetization Magnetic anisotropy Perpendicular magnetic anisotropy Perpendicular magnetic recording Disk recording
Content Type	Text
Resource Type	Article
Subject	Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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