NDLI: Optimization of ICPCVD Amorphous Silicon for Optical MEMS Applications

Content Provider	IEEE Xplore Digital Library
Author	Tripathi, D.K. Fei Jiang Martyniuk, M. Antoszewski, J. Dilusha Silva, K.K.M.B. Dell, J.M. Faraone, L.
Copyright Year	1992
Abstract	In this paper, we present the optimization of optical and mechanical properties of inductively coupled plasma chemical vapor deposited (ICPCVD) amorphous silicon thin films for fabrication of high-quality optical microelectromechanical systems-based devices operating from visible to short-wave infrared wavelengths (450-3000 nm). Our results indicate that, at relatively high deposition temperatures for plasma CVD, a decrease in the ICP power results in films with lower tensile stress, higher refractive index, and lower extinction coefficient. We show that hydrogen concentration alone is not a sufficient parameter for controlling optical and mechanical quality of the films. In particular, both the hydrogen concentration and the hydrogen-silicon bonding nature together play a vital role in determining the optical and the mechanical quality of the silicon thin films. As a demonstration vehicle, three layer silicon-silicon oxide-silicon-based distributed Bragg reflectors were fabricated for the visible (500-700 nm), near infrared (700-1000 nm), and short-wave infrared (2000-3000 nm) wavelength ranges using an optimized silicon fabrication recipe. The measured optical transmission spectra show close to 90% peak reflectivity. Finally, stress optimization was evaluated by fabricating 270-μm diameter circular suspended silicon membranes, which demonstrate a flatness variation on the order of <;6 nm across the entire lateral dimension.
Sponsorship	IEEE Electron Devices Society American Society of Mechanical Engineering (ASME)
Starting Page	1998
Ending Page	2007
Page Count	10
File Size	1469476
File Format	PDF
ISSN	10577157
Volume Number	24
Issue Number	6
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2015-01-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Iterative closest point algorithm Optical refraction Optical variables control Integrated optics Optical device fabrication Silicon Refractive index silicon-hydrogen bonding. Optical microelectromechanical systems (MEMS) distributed Bragg reflector (DBR) optical constants silicon-hydrogen bonding
Content Type	Text
Resource Type	Article
Subject	Mechanical Engineering Electrical and Electronic Engineering

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4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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