NDLI: Micromasking of plasma etching due to bacteria: a yield detractor for ULSI

Content Provider	IEEE Xplore Digital Library
Author	Perera, A.H. Satterfield, M.J.
Copyright Year	1988
Abstract	Continued size reduction of semiconductor microelectronic circuits increases their sensitivity to ultra small particulate contaminants. A form of self-replicating particulate is bacteria found in ultrapure water systems. The bacteria can micromask plasma etches causing electrical shorts between adjacent conduction paths, thereby providing a key yield loss mechanism when fabricating high density circuits. This paper discusses defects caused by water born bacteria in tight pitch repetitive patterns found in high density memory circuits. Using high resolution wafer inspection tools and scanning electron microscopy, intentionally introduced bacteria were located on wafers before plasma etching and the same locations were inspected after the etch was completed. While in some cases the defect formed followed the bacteria shape, in many instances the post-etch defects did not resemble the original bacteria in any way. Besides electrical shorts between conducting regions, due to the specifics of the technology, defects due to bacteria micromasking of dry etches can also cause failures between two layers of polysilicon. The "before" and "after" data provided by this work present a means of identifying a key defect source, namely bacteria, based on defect appearance.
Sponsorship	IEEE Electron Devices Society IEEE Components, Packaging, and Manufacturing Technology Society IEEE Reliability Society IEEE Solid-State Circuits Society
Starting Page	577
Ending Page	580
Page Count	4
File Size	747351
File Format	PDF
ISSN	08946507
Volume Number	9
Issue Number	4
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1996-11-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma applications Etching Indium tin oxide Microorganisms Ultra large scale integration Circuit testing Plasma density Microelectronics Inspection Water pollution
Content Type	Text
Resource Type	Article
Subject	Industrial and Manufacturing Engineering Condensed Matter Physics Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering

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3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
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