NDLI: Cathode Plasma Integral Spectroscopy Diagnosis on High Current Pulsed Electron Beam Diode

Content Provider	IEEE Xplore Digital Library
Author	Yao Weibo Zhang Yongmin Tang Junping Guo Jianming Cheng Liang
Copyright Year	1973
Abstract	Cathode plasma is an important factor affecting the cathode emission on high current pulsed electron beam diode. Diagnosing the cathode plasma composition by integral spectrum system is a method for studying the cathode plasma formation and development process. The aim of this paper is to study the cathode plasma composition and analyze the cathode plasma formation mechanism by integral spectroscopic diagnosis of different materials and cathode pretreatments. Experiment results show that not only cathode material itself, but also impurity material and adsorptive gas on cathode surface are found in the cathode plasma. For the same material, the cathode plasma composition remains unchanged, whereas the characteristic line intensity decreases as the experiment times increase. The composition of the cathode plasma can be controlled by adulterated treatment.
Sponsorship	IEEE Nuclear and Plasma Sciences Society
Starting Page	3264
Ending Page	3267
Page Count	4
File Size	1002587
File Format	PDF
ISSN	00933813
Volume Number	42
Issue Number	10
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2014-01-01
Publisher Place	U.S.A.
Access Restriction	One Nation One Subscription (ONOS)
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Cathodes Plasmas Materials Graphite Electron beams Copper Surface treatment integral spectroscopy. Cathode plasma electron beam high current diode integral spectroscopy
Content Type	Text
Resource Type	Article
Subject	Nuclear and High Energy Physics Condensed Matter Physics

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