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Metal etching composition
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 1991 |
| Description | The present invention is directed to a chemical etching composition for etching metals or metallic alloys. The composition includes a solution of hydrochloric acid, phosphoric acid, ethylene glycol, and an oxidizing agent. The etching composition is particularly useful for etching metal surfaces in preparation for subsequent fluorescent penetrant inspection. |
| File Size | 282949 |
| Page Count | 3 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19920016156 |
| Archival Resource Key | ark:/13960/t55f3qs1t |
| Language | English |
| Publisher Date | 1991-07-23 |
| Access Restriction | Open |
| Subject Keyword | Inorganic And Physical Chemistry Phosphoric Acid Nondestructive Tests Metal Surfaces Metals Inventions Glycols Etching Chemical Composition Ethylene Compounds Surface Treatment Oxidizers Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Patent |