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Monolithic microcircuit techniques and processes
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Author | Kennedy, B. W. |
| Copyright Year | 1972 |
| Description | Brief discussions of the techniques used to make dielectric and metal thin film depositions for monolithic circuits are presented. Silicon nitride deposition and the properties of silicon nitride films are discussed. Deposition of dichlorosilane and thermally grown silicon dioxide are reported. The deposition and thermal densification of borosilicate, aluminosilicate, and phosphosilicate glasses are discussed. Metallization for monolithic circuits and the characteristics of thin films are also included. |
| File Size | 4469001 |
| Page Count | 60 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19720022582 |
| Archival Resource Key | ark:/13960/t0wq4qx69 |
| Language | English |
| Publisher Date | 1972-06-15 |
| Access Restriction | Open |
| Subject Keyword | Electronics Thin Films Integrated Circuits Vapor Deposition Metal Films Production Engineering Metallizing Silicon Nitrides Chemical Reactions Dielectrics Sputtering Vacuum Deposition Silicon Dioxide Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |
