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Automated semiconductor vacuum chemical vapor deposition facility
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 1982 |
| Description | A semiconductor vacuum chemical vapor deposition facility (totally automatic) was developed. Wafers arrived on an air track, automatically loaded into a furnace tube, processed, returned to the track, and sent on to the next operation. The entire process was controlled by a computer. |
| File Size | 676717 |
| Page Count | 9 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_19820012384 |
| Archival Resource Key | ark:/13960/t8tb5xx21 |
| Language | English |
| Publisher Date | 1982-01-01 |
| Access Restriction | Open |
| Subject Keyword | Inorganic And Physical Chemistry Vapor Deposition Semiconducting Films Depersonalization Semiconductors Materials Automatic Control Silicon Nitrides Silicon Vacuum Deposition Silicon Dioxide Ntrs Nasa Technical Reports ServerĀ (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Technical Report |