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Method of forming ultra thin film devices by vacuum arc vapor deposition
| Content Provider | NASA Technical Reports Server (NTRS) |
|---|---|
| Copyright Year | 2005 |
| Description | A method for providing an ultra thin electrical circuit integral with a portion of a surface of an object, including using a focal Vacuum Arc Vapor Deposition device having a chamber, a nozzle and a nozzle seal, depressing the nozzle seal against the portion of the object surface to create an airtight compartment in the chamber and depositing one or more ultra thin film layer(s) only on the portion of the surface of the object, the layers being of distinct patterns such that they form the circuit. |
| File Size | 739350 |
| Page Count | 8 |
| File Format | |
| Alternate Webpage(s) | http://archive.org/details/NASA_NTRS_Archive_20080005115 |
| Archival Resource Key | ark:/13960/t26b23p9z |
| Language | English |
| Publisher Date | 2005-03-15 |
| Access Restriction | Open |
| Subject Keyword | Electronics And Electrical Engineering Thin Films Patents Vapor Deposition Circuits Vacuum Deposition Ntrs Nasa Technical Reports Server (ntrs) Nasa Technical Reports Server Aerodynamics Aircraft Aerospace Engineering Aerospace Aeronautic Space Science |
| Content Type | Text |
| Resource Type | Patent |
