NDLI: Structure and refractive index of thin alumina films grown by atomic layer deposition

Content Provider	Springer Nature Link
Author	Aguilar Gama, M. Tulio Ramírez Morales, Erik Montiel González, Z. Mendoza Galván, A. Sotelo Lerma, Mérida Nair, P. K. Hu, Hailin
Copyright Year	2014
Abstract	Aluminum oxide (Al$_{2}$O$_{3}$) is a good dielectric material for optoelectronic applications. With technologies such as atomic layer deposition (ALD), homogeneous ultrathin films of Al$_{2}$O$_{3}$ can be obtained at moderate temperatures. In this work, Al$_{2}$O$_{3}$ thin films of thickness up to 310 nm were obtained by ALD at 150 and 175 °C with trimethylaluminum and H$_{2}$O as precursors. The nitrogen purging pulses were kept short (1 or 2 s) to reach the growth rate of about 0.14 nm/cycle at 150 °C and 0.15 nm/cycle at 175 °C after 800 deposition cycles. The obtained films were amorphous and showed a good homogeneity over a 2 × 2 cm$^{2}$ area confirmed by optical reflectance. X-ray photoelectron spectroscopy analysis on the surface of the ALD samples indicate that films deposited at 150 °C contained more carbon-related bonds, which probably arise from incomplete surface reaction or insufficient N$_{2}$ purging time. Results of spectroscopic ellipsometry (SE) reveal that the refractive indices (n) of the ALD films are systematically lower than that of crystalline α-Al$_{2}$O$_{3}$ in the wavelength range, 240–850 nm. Higher deposition temperature increased slightly the n values, but at the same time it also increased the roughness of the film surface. A good match between the film thicknesses estimated by SE and from the cross-sectional scanning electron microscopy images of the same group of samples confirms the effectiveness of the SE modeling to study the homogeneity of the alumina films deposited by ALD on silicon substrates.
Starting Page	5546
Ending Page	5552
Page Count	7
File Format	PDF
ISSN	09574522
Journal	Journal of Materials Science: Materials in Electronics
Volume Number	26
Issue Number	8
e-ISSN	1573482X
Language	English
Publisher	Springer US
Publisher Date	2014-06-27
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Optical and Electronic Materials Characterization and Evaluation of Materials
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Biomaterials Biophysics Condensed Matter Physics Electronic, Optical and Magnetic Materials Bioengineering Electrical and Electronic Engineering Biomedical Engineering

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