NDLI: Characterization of interface defects in BiFeO$_{3}$ metal–oxide–semiconductor capacitors deposited by radio frequency magnetron sputtering

Content Provider	Springer Nature Link
Author	Kaya, Sel Yilmaz, Ercan Aktag, Aliekber Seidel, Jan
Copyright Year	2015
Abstract	In this work, we study the structural and electrical properties of BiFeO$_{3}$ MOS capacitors with a special focus on the oxide–semiconductor interface for gate dielectric applications. For this purpose BiFeO$_{3}$ thin films with a thickness of 300 nm were deposited on p-type Si (100) substrates at 0 °C by RF sputtering. Half of the films were annealed at 550 °C for 30 min in atmospheric environment while the other half were kept as-deposited. XRD and SEM measurements were performed for both samples for structural characterization. MOS capacitors were fabricated by evaporation technique using Al from samples. For electrical characterizations of MOS capacitors, capacitance–voltage (C–V), conductance–frequency (G$_{p}$/ω–F) and leakage current density–voltage (J–V) measurements were performed. The XRD analyses show that BiFeO$_{3}$ thin films are polycrystalline with some impurity phases, which influence the electronic device properties. The formation of crystallization is confirmed by SEM measurements. Debye length, barrier height and flat band voltages showed variations due to the frequency dependent charges, partially originating from interface defects, in the device structure. Therefore ignoring effects of frequency dependent charges can lead to significant errors in the analysis of electrical characteristics of MOS capacitors. Moreover, the obtained results from analyses of C–V, G$_{p}$/ω–F and J–V characteristics of annealed samples depict that all measured and calculated parameters are of the same order for novel MOS devices. Hence, the BiFeO$_{3}$ dielectric layer in fabricated MOS devices exhibits a stable insulation property for gate dielectric applications.
Starting Page	5987
Ending Page	5993
Page Count	7
File Format	PDF
ISSN	09574522
Journal	Journal of Materials Science: Materials in Electronics
Volume Number	26
Issue Number	8
e-ISSN	1573482X
Language	English
Publisher	Springer US
Publisher Date	2015-05-09
Publisher Place	New York
Access Restriction	One Nation One Subscription (ONOS)
Subject Keyword	Optical and Electronic Materials Characterization and Evaluation of Materials
Content Type	Text
Resource Type	Article
Subject	Atomic and Molecular Physics, and Optics Biomaterials Biophysics Condensed Matter Physics Electronic, Optical and Magnetic Materials Bioengineering Electrical and Electronic Engineering Biomedical Engineering

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