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Energy dissipation in atomic force microscopy and atomic loss processes.
| Content Provider | Semantic Scholar |
|---|---|
| Author | Hoffmann, Peter Manfred Jeffery, Sla Pethica, John B. Ozer, H. Ozgür |
| Copyright Year | 2001 |
| Abstract | Atomic scale dissipation is of great interest in nanomechanics and atomic manipulation. We present dissipation measurements with a linearized, ultra-small amplitude atomic force microscope which is capable of measuring dissipation at chosen, fixed separations. We show that the dynamic dissipation in the noncontact regime is of the order of a few 10-100 meV per cycle. This dissipation is likely due to the motion of a bistable atomic defect in the tip-surface region. In the contact regime we observe dc hysteresis associated with nanoscale plasticity. We find the hysteretic energy loss to be 1 order of magnitude higher for a silicon surface than for copper. |
| Starting Page | 265502 |
| Ending Page | 265502 |
| Page Count | 1 |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://repository.bilkent.edu.tr/bitstream/handle/11693/24755/bilkent-research-paper.pdf;jsessionid=384636F49A61E69617B3DD676BB2C8DE?sequence=1 |
| Alternate Webpage(s) | https://www.nano.com.tr/article/SPM-Controller/SPM-Controller-6.pdf |
| PubMed reference number | 11800839v1 |
| Volume Number | 87 |
| Issue Number | 26 |
| Journal | Physical review letters |
| Language | English |
| Access Restriction | Open |
| Subject Keyword | Fatigue Microscope Device Component Microscopy, Atomic Force Scanning Probe Microscopes (device) Silicon |
| Content Type | Text |
| Resource Type | Article |
