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Investigation of molybdenum-carbon films (Mo–C:H) deposited using an electron cyclotron resonance chemical vapor deposition system
| Content Provider | Semantic Scholar |
|---|---|
| Author | Rusli Yoon, Soon Fatt Huang, Qing Yang, Hui Ying Yu, Ming Bin Ahn, Jaehui Zhang, Qichong Osipowicz, Thomas Watt, Fiona M. |
| Copyright Year | 2000 |
| Abstract | We have recently proposed a technique for depositing metal incorporated carbon films (Me–C:H) based on an electron cyclotron resonance chemical vapor deposition (ECR) process. This technique employs an ECR plasma derived from the excitation of source gases CH4 and Ar, together with two grids embedded within the chamber that serve as the source of the metal. It has been successfully applied for the deposition of tungsten–carbon films (W–C:H) which have been shown to exhibit a wide range of electrical, optical, and microstructural properties. These properties can be controlled through varying the deposition conditions such as the bias voltages at the grids and the substrate holder, and the flow ratio of CH4/Ar. In this work, we report on the growth and characterization of molybdenum–carbon (Mo–C:H) films deposited using the above technique incorporating two pure Mo grids. The effect of radio-frequency induced direct-current (dc) bias at the substrates was investigated. It was found that the resistivity of t... |
| Starting Page | 3699 |
| Ending Page | 3704 |
| Page Count | 6 |
| File Format | PDF HTM / HTML |
| DOI | 10.1063/1.1288224 |
| Alternate Webpage(s) | http://www.ciba.nus.edu.sg/publications/mat/mat2000_5.pdf |
| Alternate Webpage(s) | https://doi.org/10.1063/1.1288224 |
| Volume Number | 88 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
