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High Rate Deposition of Ta-C:H Using an Electron Cyclotron Wave Resonance Plasma Source
| Content Provider | Semantic Scholar |
|---|---|
| Author | Morrison, Natalie A. Muhl, S. Rodil, Sandra E. Milne, William I. Robertson, John Charles Weiler, Mathias Wang, P. Z. Hutchings, Ian M. Stolojan, Vlad Brown, L. M. |
| Copyright Year | 1997 |
| Abstract | A compact electron cyclotron wave resonance (ECWR) source has been developed for the high rate deposition of hydrogenated tetrahedral amorphous carbon (ta-C:H). The ECWR provides growth rates of up to 1.5 nm/s over a 4-inch diameter and an independent control of the deposition rate and ion energy. The ta-C:H was deposited using acetylene as the source gas and was characterized as having an sp content of up to 77%, plasmon energy of 27 eV, refractive index of 2.45, hydrogen content of about 30%, optical gap of up to 2.1 eV and RMS surface roughness of 0.04 nm. q 1999 Elsevier Science S.A. All rights reserved. |
| File Format | PDF HTM / HTML |
| DOI | 10.1557/PROC-498-147 |
| Volume Number | 498 |
| Alternate Webpage(s) | http://www-g.eng.cam.ac.uk/nms/publications/pdf/MorrisonTSF1999.pdf |
| Alternate Webpage(s) | https://doi.org/10.1557/PROC-498-147 |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
