Modeling of chemical mechanical polishing for shallow trench isolation (2002)

Thesis

Modeling of reverse tone etchback shallow trench isolation chemical mechanical polishing (2001).

Dislocation-free shallow trench isolation (sti) chemical mechanical polishing (cmp) process for embedded flash memory.

Dislocation-Free Shallow Trench Isolation (STI) Chemical Mechanical Polishing (CMP) Process for Embedded Flash Memory

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Shallow Trench Isolation ( STI ) Chemical Mechanical Polishing ( CMP ) Process for Advanced Logic Technology

Article

Effects of underlying films on the chemical-mechanical polishing for shallow trench isolation technology

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Dummy feature placement for chemical-mechanical polishing uniformity in a shallow trench isolation process

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Mechanism of high selectivity in ceria based shallow trench isolation chemical mechanical polishing slurries

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Online available since 2007/jun/15 dislocation-free shallow trench isolation (sti) chemical mechanical polishing (cmp) process for embedded flash memory.