NDLI: METHOD OF FORMING A HARD MASK FOR HALO IMPLANTS BACKGROUND OF THE INVENTION 1. Field of the Invention

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METHOD OF FORMING A HARD MASK FOR HALO IMPLANTS BACKGROUND OF THE INVENTION 1. Field of the Invention

Content Provider	Semantic Scholar
Author	Lee, Eddie Díaz, Jose Ramon
Copyright Year	2017
Abstract	(54) METHOD OF FORMING A HARD MASK 5,518,941. A 5/1996 Lin et al. .................... 438/291 FOR HALO MPLANTS 5,534,449 A * 7/1996 Dennison et al. ........... 438/231 5,741,736 A * 4/1998 Orlowski et al. ........... 438/286 (75) Inventors: Scott D. Luning, Austin, TX (US); 5,834,355 A : 11/1998 Doyle ........................ 438/305 David Donggang Wu, Austin, TX 5,976,937 A : 11/1999 Rodder et al. .............. 438/209 (US); Massud Aminpur, Dresden (DE) 6,017,798 A 1/2000 Ilderem et al. ............. 438/286 s s 6,087.227 A 7/2000 Hsu ........................... 438/275 6,156,593 A * 12/2000 Peng et al. ................. 438/200 (73) Assignee: Advanced Micro Devices, Inc., Austin, 6,194.278 B1 * 2/2001 Rengarajan ................. 438/302 TX (US) 6,238,967 B1 * 5/2001 Shiho et al. ................ 438/243 6,300.205 B1 * 10/2001 Fulford et al. .............. 438/303 () Notice: This patent issued on a continued pros6,362,054 B1 3/2002 Choi et al. .................. 438/266 ecution application filed under 37 CFR 2001/0046745 A1 11/2001 Divakaruni et al. ........ 438/306 1.53(d), and is subject to the twenty year 2002/0055212 A1 5/2002 Choi et al. .................. 438/197 patent term provisions of 35 U.S.C. 154(a)(2). cited by examiner
File Format	PDF HTM / HTML
Alternate Webpage(s)	https://patentimages.storage.googleapis.com/be/a1/34/305b7cef4b1c14/US6624035.pdf
Language	English
Access Restriction	Open
Content Type	Text
Resource Type	Article

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