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SiO 2 coating of silver nanoparticles by photoinduced chemical vapor deposition
| Content Provider | Semantic Scholar |
|---|---|
| Author | Boies, Adam M. Roberts, Jeffrey T. Girshick, Steven L. Zhang, Bin Nakamura, Toshitaka Mochizuki, Amane |
| Copyright Year | 2009 |
| Abstract | Gas-phase silver nanoparticles were coated with silicon dioxide (SiO2) by photoinduced chemical vapor deposition (photo-CVD). Silver nanoparticles, produced by inert gas condensation, and a SiO2 precursor, tetraethylorthosilicate (TEOS), were exposed to vacuum ultraviolet (VUV) radiation at atmospheric pressure and varying temperatures. The VUV photons dissociate the TEOS precursor, initiating a chemical reaction that forms SiO2 coatings on the particle surfaces. Coating thicknesses were measured for a variety of operation parameters using tandem differential mobility analysis and transmission electron microscopy. The chemical composition of the particle coatings was analyzed using energy dispersive x-ray spectrometry and Fourier transform infrared spectroscopy. The highest purity films were produced at 300–400 ◦C with low flow rates of additional oxygen. The photo-CVD coating technique was shown to effectively coat nanoparticles and limit core particle agglomeration at concentrations up to 107 particles cm−3. (Some figures in this article are in colour only in the electronic version) |
| File Format | PDF HTM / HTML |
| Alternate Webpage(s) | http://www.me.umn.edu/people/pdf/Boies%20et%20al%202009.pdf |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |
