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Electrical Characterization of Nanometer Structures with Graphene Directly Grown on SiO 2 by Alcohol Chemical Vapor Deposition
| Content Provider | Semantic Scholar |
|---|---|
| Author | Sato, Haruhiko Yamada, Kenji Nakamura, Atsushi Satoh, Hiroaki Temmyo, Jiro Inokawa, Hiroshi |
| Copyright Year | 2014 |
| Abstract | Graphene directly grown on SiO2 by alcohol chemical vapor deposition (CVD) was delineated into nanometer structures, and electrically characterized. Depending on the structures and sizes, aperiodic Coulomb-blockade feature and transport with a large gap were observed, although the film is rather defective as indicated by Raman spectrum and carrier mobility. |
| File Format | PDF HTM / HTML |
| DOI | 10.7567/SSDM.2014.PS-13-14L |
| Alternate Webpage(s) | https://confit.atlas.jp/guide/event-img/ssdm2014/PS-13-14L/public/pdf_archive?type=in |
| Alternate Webpage(s) | https://doi.org/10.7567/SSDM.2014.PS-13-14L |
| Language | English |
| Access Restriction | Open |
| Content Type | Text |
| Resource Type | Article |