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Effect Plasma Transport on Etched Profiles with Surface Topography in Diverging Field Electron Cyclotron Resonance Plasma
| Content Provider | Scilit |
|---|---|
| Author | Fujiwara, Nobuo Maruyama, Takahiro Yoneda, Masahiro Tsukamoto, Katsuhiro Banjo, Toshinobu |
| Copyright Year | 1994 |
| Description | Journal: Japanese Journal of Applied Physics Recent studies of electron cyclotron resonance (ECR) plasma etching for fabricating fine patterns of less than a half-micron indicate a serious problem in the etched profiles caused by a charge build-up of the patterns. The relationships between the local pattern distortion and the plasma properties measured by the electrostatic probe are investigated. Lowering the electron temperature perpendicular to the surface normal is one of the most effective techniques for eliminating the local side etch. It is enhanced by setting the wafer at the lower magnetic field. As the large space charge bends the ion trajectories, the higher ion current density also enhances the local side etch. The distribution of plasma potential which accelerates the ions can reduce the local side etch in spite of the higher current density. |
| Related Links | http://iopscience.iop.org/article/10.1143/JJAP.33.2164/pdf |
| Ending Page | 2169 |
| Page Count | 6 |
| Starting Page | 2164 |
| ISSN | 00214922 |
| e-ISSN | 13474065 |
| DOI | 10.1143/jjap.33.2164 |
| Journal | Japanese Journal of Applied Physics |
| Issue Number | 4S |
| Volume Number | 33 |
| Language | English |
| Publisher | IOP Publishing |
| Publisher Date | 1994-04-01 |
| Access Restriction | Open |
| Subject Keyword | Journal: Japanese Journal of Applied Physics Current Density Surface Topography Plasma Etching Electron Temperature Microwave Plasma Magnetic Field Space Charge Electron Cyclotron Resonance Langmuir Probe |
| Content Type | Text |
| Resource Type | Article |
| Subject | Physics and Astronomy Engineering |
