NDLI: Construction of cross-linked polymer films covalently attached on silicon substrate via a self-assembled monolayer

Content Provider	Royal Society of Chemistry (RSC)
Author	Fa, Wenjun Zheng, Zhi Zhao, Hongxiao Lau, Woon Ming Kwok, Raymund W. M. He, Weiwei Wong, Ka-wai
Copyright Year	2013
Abstract	A new synthetic approach was developed to fabricate cross-linked polymer films covalently attached on a silicon substrate via a self-assembled monolayer (SAM) using a low energy proton beam as the initiator. The widely used silane coupling reagent 3-(mercaptopropyl) trimethoxysilane [HS(CH2)3Si(OCH3)3] was employed as an intermediate SAM to chemically bond the cross-linked polymer film to the silicon substrate. Dotriacontane was selected as a precursor that was spin-coated on the SAM-terminated silicon wafers. The film thickness can be easily controlled by spin-coating precursor solutions of different concentrations. X-ray photoelectron spectroscopy (XPS), atomic force microscopy (AFM) and contact angle measurements confirmed the formation of SAM on the silicon substrate and the subsequent cross-linkage between the SAM and the upper polymer film formed. The resulting cross-linked polymer films are relatively stable, with all layers covalently attached together so that the whole film could not be removed by rinsing in both organic solvent and even more reactive HF solutions. In particular, the resistance of the cross-linked polymer film towards HF etching can be useful for lithography and device fabrication for polymer based electronics. The capability of using different SAMs to attach various polymer films was also demonstrated.
Starting Page	11580
Ending Page	11585
Page Count	6
File Format	HTM / HTML PDF
ISSN	20462069
Volume Number	3
Issue Number	29
Journal	RSC Advances
DOI	10.1039/c3ra40949j
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	Dotriacontane Chemical milling Hydrogen Polymer Photoemission spectroscopy Contact angle Reagent Atomic-force microscopy Covalent bond Self-assembled monolayer Photolithography Solvent Silane X-ray photoelectron spectroscopy
Content Type	Text
Resource Type	Article
Subject	Chemistry Chemical Engineering

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