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Smooth, aggregate-free self-assembled monolayer deposition of silane coupling agents on silicon dioxide.

Content Provider	Semantic Scholar
Author	Diebold, Roger Mitchell Clarke, David R.
Copyright Year	2012
Abstract	Silane coupling agents (SCAs) are notorious for aggregating during deposition on oxide substrates, leading to nonuniform surface morphologies. To ameliorate this problem, we describe a vapor-phase deposition technique for silane coupling agents employing a spin-coated perfluoropolyether (PFPE) diffusion barrier that facilitates the formation of smooth, aggregate-free self-assembled monolayers (SAMs). Samples fabricated using PFPE barrier layers yielded SAMs exhibiting similar water contact angles, reduced water contact angle hysteresis, and a 2-fold reduction in rms roughness relative to those without a barrier. X-ray photoelectron spectroscopy confirms that the barrier layer can be completely removed after deposition, leaving behind a smooth monolayer. A basic analysis of the agglomerate separation ability of the barrier layers is discussed to understand the critical parameters involved. Generalized guidelines for selecting barrier materials are presented.
Starting Page	1742
Ending Page	1748
Page Count	7
File Format	PDF HTM / HTML
Alternate Webpage(s)	http://clarke.seas.harvard.edu/sites/default/files/Diebold%20Langmuir%202012.pdf
Alternate Webpage(s)	https://clarke.seas.harvard.edu/files/clarke/files/diebold_langmuir_2012.pdf
PubMed reference number	23066941v1
Alternate Webpage(s)	https://doi.org/10.1021/la303377w
DOI	10.1021/la303377w
Journal	Langmuir : the ACS journal of surfaces and colloids
Volume Number	28
Issue Number	44
Language	English
Access Restriction	Open
Subject Keyword	Departure - action Exhibits as Topic Photoelectron Spectroscopy Silicon Dioxide anatomical layer perfluoropolyether silane vapor
Content Type	Text
Resource Type	Article

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