NDLI: Thickness control of graphene deposited over polycrystalline nickel

Content Provider	Royal Society of Chemistry (RSC)
Author	Valverde, Jose Luis Lavin-Lopez, Ma Prado Sanchez-Silva, Luz Ruiz-Enrique, Ma Inmaculada Romero, Amaya
Copyright Year	2015
Abstract	The optimization of the graphene growth over polycrystalline nickel foils using an atmospheric pressure Chemical Vapor Deposition set-up is reported. CH4 and H2 were used as precursor gases. Optical microscopy and Raman spectroscopy were used for graphene characterization. A thickness value related to the number of graphene layers in the synthesized samples was quantified using an Excel-VBA application, which assigned a thickness value between 0 and 1000 and allowed one to know the percentage of each type of graphene (monolayer, bilayer, multilayer) deposited over the Ni foil. The influence of reaction temperature, CH4/H2 flow rate ratio and reaction time was studied in detail. Optical microscopy showed that the samples were not homogeneous, being covered with multilayer, few-layer, bilayer and monolayer graphene. Synthesis variables were optimized according to the thickness value. There was observed a maximum thickness value (781) for 980 °C, a CH4/H2 flow rate ratio of 0.07 v/v and a reaction time of 60 seconds. At these conditions, about 77% of the Ni foil was covered with monolayer graphene.
Starting Page	4414
Ending Page	4423
Page Count	10
File Format	HTM / HTML PDF
ISSN	11440546
Volume Number	39
Issue Number	6
Journal	New Journal of Chemistry
DOI	10.1039/c5nj00073d
Language	English
Publisher	Royal Society of Chemistry
Access Restriction	Open
Subject Keyword	Atmospheric pressure Microscopy Graphene Crystallite Raman Nickel Rate ratio Raman spectroscopy Mathematical optimization Chemical vapor deposition
Content Type	Text
Resource Type	Article
Subject	Chemistry Materials Chemistry Catalysis

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