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The Journal of Engineering

Comparison of optimised conditions for inductively coupled plasma-reactive ion etching of quartz substrates and its optical applications

Content Provider	IET Digital Library
Author	Tang, Yu Hsiang Lin, Yu Hsin Chen, Po Li Shiao, Ming Hua Hsiao, Chien Nan
Abstract	A C4F8/He inductively coupled plasma-reactive ion etching (ICP-RIE) was studied to improve the etching conditions of quartz glass. The influences of C4F8 flow rate, He flow rate, chamber pressure, inductively coupled plasma (ICP) power, bias power and cooling temperature were investigated. A report is presented on an optimum etching condition for fabricating quartz-based optical components considering their application in diffractive optical element (DOE) devices. As per these etching results, the etched microstructure exhibited a depth of 44.2 μm and a vertical sidewall angle of 89° resulting from an ICP power of 3000 W, a bias power of 200 W, a chamber pressure of 2.5 mTorr and an etching time of 120 min in a mixture of C4F8 and He gases with 30 and 100 sccm flow rates, respectively. The successful fabrication of the DOE component by ICP-RIE is reported. This can be used to provide the uniform light intensity distribution for a DOE device.
Starting Page	395
Ending Page	398
Page Count	4
Volume Number	9
e-ISSN	17500443
Issue Number	Issue 6, Jun (2014)
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/mnl/9/6
Alternate Webpage(s)	https://digital-library.theiet.org/content/journals/10.1049/mnl.2014.0093
Journal	Micro & Nano Letters
Publisher Date	2014-06-16
Access Restriction	Open
Rights Holder	© The Institution of Engineering and Technology
Subject Keyword	Bias Power C4F8 Flow Rate Chamber Pressure Cooling Temperature Depth 44.2 Mum Diffractive Optical Element Diffractive Optical Element Device DOE Component Fabrication He Flow Rate ICP-RIE Inductively Coupled Plasma Power Inductively Coupled Plasma-reactive Ion Etching Light Intensity Distribution Micro-optical Device And Technology Micro-optics Microelectromechanical System Microstructure Optical Device Optical Element Optical Fabrication Optical Glass Optical Material Optical System Plasma Application in Manufacturing And Material Processing Plasma Material Processing Power 200 W Power 3000 W Pressure 2.5 Mtorr Quartz Quartz (optical Material) Quartz Glass Substrates Quartz-based Optical Component SiO2 Sputter Etching Surface Grinding Surface Treatment And Degradation of Glasses Time 120 Min
Content Type	Text
Resource Type	Article

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