NDLI: High-Speed and Multi-Bit Resistive Switching Brought about by Migration of Hydrogen Ions in Resistive Random Access Memory Consisting of Bi2Sr2CaCu2O8+delta Single Crystal

Content Provider	IEEE Xplore Digital Library
Author	Hanada, A. Kinoshita, K. Matsubara, K. Kishida, S.
Copyright Year	2012
Abstract	We clarified that the resistive switching effect in transition metal oxides (TMOs) is caused by redox reaction due to the migration of oxygen ions of the oxygen-depleted layer formed at the interface between electrode and TMO. Additionally, we discovered that the resistive switching effect can be developed by redox reaction in a broad sense that is not restricted in oxygen migration. Hydrogen ions were efficiently introduced into Bi2Sr2CaCu2O8+δ (Bi-2212) single crystal with the assistance of the catalytic effect of Pt. The resistance switching which has the opposite relation between the polarity of the applied voltage and the resultant resistance change to that observed in Bi-2212 with no hydrogen introduction was observed. Characteristics of the resistive switching by migration of hydrogen ions were evaluated and, as a result, high applicability to a multi-bit application, low energy consumption, and very fast operation within 5 ns were revealed.
Starting Page	1
Ending Page	4
File Size	417158
Page Count	4
File Format	PDF
ISBN	9781467310796
e-ISBN	9781467310819
DOI	10.1109/IMW.2012.6213685
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-05-20
Publisher Place	Italy
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Resistance Electrodes Gold Annealing Atmosphere Switches Ions
Content Type	Text
Resource Type	Article

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