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| Content Provider | IEEE Xplore Digital Library |
|---|---|
| Author | Vlad, A. Jedrasik, P. Dutu, C.A. Serban, D.A. Guillet, P. Fustin, C.-A. Sodervall, U. Gohy, J.F. Melinte, S. |
| Copyright Year | 2010 |
| Description | Author affiliation: Department of Microtechnology and Nanosciences MC2, Chalmers University of Technology, SE-412 96 Göteborg, Sweden (Jedrasik, P.; Sodervall, U.) || Unité de Chimie des Matériaux Inorganiques et Organiques, Université catholique de Louvain, Place L. Pasteur 1, B-1348 Louvain-la-Neuve, Belgium (Guillet, P.; Fustin, C.-A.; Gohy, J.F.) || Laboratoire de Dispositifs Intégrés et Circuits Electroniques, Université catholique de Louvain, B-1348 Louvain la Neuve, Belgium (Vlad, A.; Dutu, C.A.; Serban, D.A.; Melinte, S.) |
| Abstract | We report on a newly developed technology for the nanoscale processing of the conducting polyaniline (PANI) with an unprecedented areal patterning order and density control exceeding 0.25 $teradot/inch^{2}.$ A simple two-step process is put forward to hierarchically build a large variety of functional PANI nanostructures on virtually any type of flexible or rigid substrates. Using template confinement, through Pt catalyzed electroless growth, highly-ordered arrays of distinct PANI nanowires are produced. Complex three-dimensional (3D) structural control is achieved through a direct pattern transfer using a novel type of resist- and dose-modulated 3D electron beam lithography. The method is scalable and provides a generic approach for nanopatterning surfaces with functional polymers. Aspects of the nanoscale PANI growth mechanism are discussed and the highly controllable, sub-picogram scale fabrication is emphasized. Simple schemes for single PANI nanowire fabrication, processing and device integration are presented. |
| Starting Page | 429 |
| Ending Page | 430 |
| File Size | 315074 |
| Page Count | 2 |
| File Format | |
| ISBN | 9781424435432 |
| DOI | 10.1109/INEC.2010.5424497 |
| Language | English |
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Publisher Date | 2010-01-03 |
| Publisher Place | China |
| Access Restriction | Subscribed |
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
| Subject Keyword | Fabrication Nanofabrication Electron beams Nanopatterning Lithography Platinum Resists Nanostructures Nanowires Polymers |
| Content Type | Text |
| Resource Type | Article |
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