NDLI: Carbon nanotubes synthesized by plasma enhanced CVD: Preparation for measurements of their electrical properties for application in pressure sensor

Content Provider	IEEE Xplore Digital Library
Author	Ficek, R. Vrba, R. Bo-Hyun Kim Goodnick, S.M. Milicic, S. Kucerova, Z. Zajickova, L. Elias, M.
Copyright Year	2006
Description	Author affiliation: Dept. of Microelectron., Brno Univ. of Technol. (Ficek, R.; Vrba, R.)
Abstract	Carbon nanotubes (CNTs) were synthesized in atmospheric pressure microwave plasma torch in the mixture of argon, methane and hydrogen on the silicon substrate with $SiO_{2}$ overlayer and a thin top iron film serving as a catalyst. This deposition technique is unique because of its simplicity and high CNT growth rate but it is still under investigation as concerns exits around its reproducibility. CNTs were deposited with the future prospect of their applications or further characterization that might require CNTs in the form of suspension or powder. One of the research directions includes measurements of CNT electrical properties such as their current-voltage (I-V) characteristics. Preparation of solutions with well dispersed CNTs was studied using various liquids (distilled water, ethyl alcohol) and ultrasonication. Dried drops of these solutions were investigated by scanning electron microscopy (SEM) and atomic force microscopy (AFM) in order to assess CNT appearance and dispersion. Electrical measurement chips with gold electrodes were prepared by electron lithography. CNTs were placed on the chips by dropping their solution and the I-V characteristics may be measured by contacting the electrodes bridged by CNTs
Sponsorship	ECTI, Thailand NECTEC, Thailand King Mongkut's Inst. of Tech., Thailand IEEE Circuits and Syst. Soc
Starting Page	857
Ending Page	860
File Size	4234682
Page Count	4
File Format	PDF
ISBN	0780397401
DOI	10.1109/ISCIT.2006.339858
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2006-10-18
Publisher Place	Thailand
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Plasma properties Atmospheric-pressure plasmas Plasma applications Atomic force microscopy Scanning electron microscopy Ultrasonic variables measurement Electric variables measurement Carbon nanotubes Plasma measurements Pressure measurement
Content Type	Text
Resource Type	Article

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