NDLI: A microfabrication compatible approach to 3-dimensional patterning of bio-molecules at Bio-MEMS and biosensor surfaces

Content Provider	IEEE Xplore Digital Library
Author	Keegan, N. Suarez, G. Spoors, J.A. Ortiz, P. Hedley, J. McNeil, C.J.
Copyright Year	2009
Description	Author affiliation: Ecole Polytechnique Fédérale de Lausanne, CH-1015 Lausanne, Switzerland (Suarez, G.) \|\| Newcastle University, Newcastle upon Tyne, UK (Keegan, N.; Spoors, J.A.; Ortiz, P.; Hedley, J.; McNeil, C.J.)
Abstract	The present work describes a methodology for patterning biomolecules on silicon analytical devices, such as novel Bio-MEMS or conventional biosensors, that reconciles three-dimensional (3-D) biological functionalisation with standard resist lift-off techniques. Unlike classic sol-gel approaches in which the biomolecule of interest is introduced within the sol mixture, a two-stage scenario has been developed. It consists firstly of patterning micron scale polycondensate scaffold structures — using classic microfabrication tools — which are then loaded with native biomolecules via a second simple incubation step under biologically-friendly environmental conditions. The common compatibility issue between the biological and microfabrication worlds has been circumvented since native recognition biomolecules can be introduced into the host scaffolds downstream of all compatibility issues. The scaffolds can be generated on any silicon substrate via polycondensation of aminosilane — namely aminopropyltriethoxy silane (APTES) — under conditions that are fully compatible with resist mask lithography. The scaffold porosity and high primary amine content allow proteins and nucleic acid sequences to penetrate the polycondensate and to interact strongly, thus giving rise to micron/sub-micron 3-D structures exhibiting high biological activity. The integration of such a bio-patterning approach in the microfabrication process of analytical devices has been demonstrated via the successful biofunctionalisation with recognition antibodies and/or nucleic acid sequences of MEMS circular diaphragm resonator (CDR) sensor patterns.
Starting Page	17
Ending Page	20
File Size	874241
Page Count	4
File Format	PDF
ISBN	9781424449170
DOI	10.1109/BIOCAS.2009.5372094
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2009-11-26
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Proteins Micromechanical devices Solvents Lithography Molecular biophysics Resists Dynamic range Silicon Biosensors Pattern analysis
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Advanced lithography for high aspect ratio MEMS technology

CMOS-compatible back-end process for in-plane actuating ferromagnetic MEMS

3C-SiC on Si: A bio- and hemo-compatible material for advanced nano-bio devices

Moving-Mask UV Lithography for 3-Dimensional Positive-And Negative-Tone Thick Photoresist Microstructuring

Maskless Direct Write Grayscale Lithography for MEMS Applications

Design Method of 3-D Active Silicon Neural Microelectrode Biosensor Based on MEMS Technology

Fabrication technology of CMOS-MEMS probe chip compatible with electroless nickel plating process

High aspect ratio microreactor for MEMS fuel cells

Fabrication of Three Dimensional X-ray Mask using MEMS Technology

A microfabrication compatible approach to 3-dimensional patterning of bio-molecules at Bio-MEMS and biosensor surfaces

Similar Documents

Advanced lithography for high aspect ratio MEMS technology

CMOS-compatible back-end process for in-plane actuating ferromagnetic MEMS

3C-SiC on Si: A bio- and hemo-compatible material for advanced nano-bio devices

Moving-Mask UV Lithography for 3-Dimensional Positive-And Negative-Tone Thick Photoresist Microstructuring

Maskless Direct Write Grayscale Lithography for MEMS Applications

Design Method of 3-D Active Silicon Neural Microelectrode Biosensor Based on MEMS Technology

Fabrication technology of CMOS-MEMS probe chip compatible with electroless nickel plating process

High aspect ratio microreactor for MEMS fuel cells

Fabrication of Three Dimensional X-ray Mask using MEMS Technology

A microfabrication compatible approach to 3-dimensional patterning of bio-molecules at Bio-MEMS and biosensor surfaces