NDLI: Rapid fabrication of wafer scale patterned nickel nanocone arrays for field emission applications

Content Provider	IEEE Xplore Digital Library
Author	Ee Le Shim Sang Bum Lee Eunji You Chi Jung Kang Kyu Wang Lee Young Jin Choi
Copyright Year	2012
Description	Author affiliation: Department of Chemistry, MyongJi University, Yongin 449-728, Korea (Sang Bum Lee; Kyu Wang Lee) \|\| Department of Physics, MyongJi University, Yongin 449-728, Korea (Ee Le Shim; Eunji You; Chi Jung Kang; Young Jin Choi)
Abstract	The Ni NCs were formed on a large area of the substrate of a 4-inch wafer. The field emission measurement of the plain NCs and patterned NCs reveals that the turn-on field is for patterned NC arrays (3.23 V/μm) is lower than that for plain NCs (3.93 V/μm) while the field enhancement factor for patterned NC arrays (2963) is greater than for plain NCs (1139). Our approach to form patterned Ni NCs involves a simple, fast, cost-effective, and scalable method to fabricate effective field emitters. This approach is suitable for creating large-scale, patterned one-dimensional nanostructures for applications in flat-panel displays or electron sources.
Starting Page	1
Ending Page	2
File Size	120779
Page Count	2
File Format	PDF
ISBN	9781467319836
e-ISBN	9781467319843
e-ISBN	9781467319829
DOI	10.1109/IVNC.2012.6316902
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-07-09
Publisher Place	Korea (South)
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Nickel Substrates Nanostructures Silicon Magnetic properties Chemicals Lithography field emitters example1 nickel nanocones field emission
Content Type	Text
Resource Type	Article

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