NDLI: The synthesis of diamond nano-tips for enhancing the plasma illumination characteristics of the capacitive type plasma devices

Content Provider	IEEE Xplore Digital Library
Author	Shiu-Cheng Lou Chulung Chen Kuang-Yau Teng Chien-Yao Tang I-Nan Lin
Copyright Year	2012
Description	Author affiliation: Department of Physics, Tamkang University, Tamsui, New Taipei, 251 Taiwan, China (Kuang-Yau Teng; Chien-Yao Tang; I-Nan Lin) \|\| Department of Electro-Optical Engineering, Yuan-Ze University, Chung-Li 32003, Taiwan, China (Shiu-Cheng Lou; Chulung Chen)
Abstract	The enhancement on the plasma illumination characteristics of a capacity-type plasma devices (CP-devices) utilizing the diamond coated Si-nanotips as cathodes was systematically investigated. The improvement on these characteristics was closely correlated with the electron field emission (EFE) properties of diamond films coated. The microcrystalline diamond films grown a ultrananocrystalline diamond nucleation layer ((MCD/UNCD), which possessed lowest turn-on field for inducing the EFE process (E=4.67 V/μm) with largest EFE current density (J=0.31 $mA/cm^{2}),$ resulted in the best plasma illumination performance for the CP-devices, as compared with those made of the MCD/Si films grown without the nucleation layer. The plasma can be triggered at the lowest threshold field of E=0.24 V/μm. Transmission electron microscopic studies revealed that the secondary microwave plasma enhanced CVD process altered the microstructure of the UNCD nuclear layer, instead of growing a layer of large-grain diamond films on top of the UNCD nuclear layer. The MCD/UNCD films that contained large diamond aggregates evenly distributed among the ultra-small grain matrix, with the induction of a-few-layer graphite, surrounding the large aggregates exhibit superior EFE and plasma illumination characteristics for the MCD/UNCD films/devices, as compared with those of the MCD/Si ones. The presence of graphene-like phase is presumed to be the prime factor resulting in superior EFE properties for the MCD films and the better plasma illumination characteristics for the CP-devices.
Starting Page	1
Ending Page	10
File Size	1334622
Page Count	10
File Format	PDF
ISBN	9781467319836
e-ISBN	9781467319843
e-ISBN	9781467319829
DOI	10.1109/IVNC.2012.6316890
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2012-07-09
Publisher Place	Korea (South)
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Films Diamond-like carbon Silicon Plasma devices Lighting Argon transmission electron microscopy Microcrystalline-ultrananocrystalline diamond composite films electron field emission properties plasma illumination characteristics
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Fabrication of nitrogen-doped ultrananocrystalline diamond nanowire arrays with enhanced field emission and plasma illumination performance

Enhancement on the stability of electron field emission behavior of carbon nanotubes by coating ultrananocrystalline diamond films

Characteristics of field emission from silicon tips covered by thin diamond-like carbon films

Field emission characteristics of amorphous carbon and diamond emitters

Silicon doped diamond-like carbon films as a coating for improvement of electron field emission

Field emission from diamond-like carbon films

Field emission of PECVD diamond like carbon thin film flat cathode on microstructured silicon pedestal

Ultrananocrystalline diamond (UNCD) films for field emission-based science and devices

Preparation of diamond-like carbon films by plasma source ion implantation with superposed pulse

The synthesis of diamond nano-tips for enhancing the plasma illumination characteristics of the capacitive type plasma devices

Similar Documents

Fabrication of nitrogen-doped ultrananocrystalline diamond nanowire arrays with enhanced field emission and plasma illumination performance

Enhancement on the stability of electron field emission behavior of carbon nanotubes by coating ultrananocrystalline diamond films

Characteristics of field emission from silicon tips covered by thin diamond-like carbon films

Field emission characteristics of amorphous carbon and diamond emitters

Silicon doped diamond-like carbon films as a coating for improvement of electron field emission

Field emission from diamond-like carbon films

Field emission of PECVD diamond like carbon thin film flat cathode on microstructured silicon pedestal

Ultrananocrystalline diamond (UNCD) films for field emission-based science and devices

Preparation of diamond-like carbon films by plasma source ion implantation with superposed pulse

The synthesis of diamond nano-tips for enhancing the plasma illumination characteristics of the capacitive type plasma devices