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| Content Provider | IEEE Xplore Digital Library | 
|---|---|
| Author | Nicolaescu, D. Sakai, S. Gotoh, Y. Ishikawa, J. | 
| Copyright Year | 2010 | 
| Description | Author affiliation: Dept. of Electronics & Information Engineering, Chubu University, 1200 Matsumoto-cho, Kasugai, Aichi 487-8501, Japan (Ishikawa, J.) || Nissin Ion Equipment Co., Ltd., 575 Kuze Tonoshiro-cho, Minami-ku, Kyoto 601-8205, Japan (Sakai, S.) || Dept. of Electronic Science and Engineering, Kyoto University, Nishikyo-ku, Kyoto 615-8510, Japan (Nicolaescu, D.; Gotoh, Y.) | 
| Abstract | Advanced ion implantation systems require transportation to wafer of space charge dominated ion beams. Compensation of ion beam divergence may be obtained through electron injection and confinement in regions of nonuniform magnetic fields. Electron sources of choice are field emitter arrays with special properties. Modeling results are presented as proof of concept, together with design aspects for practical optimization. | 
| Starting Page | 40 | 
| Ending Page | 41 | 
| File Size | 511027 | 
| Page Count | 2 | 
| File Format | |
| ISBN | 9781424478897 | 
| e-ISBN | 9781424478880 | 
| DOI | 10.1109/IVNC.2010.5563163 | 
| Language | English | 
| Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) | 
| Publisher Date | 2010-07-26 | 
| Publisher Place | USA | 
| Access Restriction | Subscribed | 
| Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) | 
| Subject Keyword | Ion beams Magnetic confinement Magnetic fields Space charge Ion implantation Clouds Trajectory ion implantation system electron confinement magnetic mirror space charge effects ion beam neutralization non-uniform magnetic field | 
| Content Type | Text | 
| Resource Type | Article | 
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