NDLI: Optical lithography using excimer lamps: 172 nm and beyond

Content Provider	IEEE Xplore Digital Library
Author	Diggs, J. Ametepe, J. Sheng Peng Kelley, M.J. Manos, D.
Copyright Year	2001
Description	Author affiliation: Dept. of Appl. Sci., Coll. of William & Mary, Williamsburg, VA, USA (Diggs, J.)
Abstract	Summary form only given. The Semiconductor Industry Association (SIA) has set 100 nm features as a goal in microelectronics by 2003. In order to achieve this goal, many research groups are studying lithography techniques such as DUV, direct write e-beam, synchrotron, excimers, and X-ray/EUV light sources. Excimer lamps as a photolithography light source offer many advantages that include high brightness, high efficiency, and tunability. Also, these lamps can be constructed without halogens, providing long lifetimes at high powers. At the College of William and Mary, we have designed and constructed two such novel excimer electrode-less lamps using Xe-Ar mixtures to produce UV light at selected wavelengths. One of the newly developed lamps uses a 1 kW 13.56 MHz capacitively coupled power source. The other lamp employs a multiple (6) magnetron power source to provide increments of 1.5 kW (up to 3 kW) of 2.45 GHz microwave power that is probe coupled to an over-moded cavity. On both lamps, experimental work was carried out to investigate the emissive output as a function of power, pressure, cooling, and gas composition. Theoretical models such as MAGIC and PSPICE were used to study the coupling of electrical energy into the plasma discharges. Further models were developed to interpret and compare the molecular emission spectra with that of other excimer lamps. The paper details the total emissive power in the <200 nm range and compare that to the total lamp output. In addition, we have shown that certain configurations have a 40% wall plug efficiency in accord with the predicted theoretical maximum.
Sponsorship	IEEE Electron Devices Soc.
File Size	67689
File Format	PDF
ISBN	0780366913
ISSN	07496877
DOI	10.1109/UGIM.2001.960314
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2001-06-20
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Lithography Lamps Light sources Couplings Electronics industry Microelectronics Synchrotrons Ultraviolet sources Brightness Educational institutions
Content Type	Text
Resource Type	Article

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