NDLI: Development of ladder type SAW RF filter with high shape factor

Content Provider	IEEE Xplore Digital Library
Author	Hashimoto, K. Ueda, M. Kawachi, O. Ohmori, H. Ikata, O. Uchishiba, H. Nishihara, T. Satoh, Y.
Copyright Year	1995
Description	Author affiliation: Fujitsu Labs. Ltd., Kawasaki, Japan (Hashimoto, K.; Ueda, M.; Kawachi, O.; Ohmori, H.)
Abstract	The paper presents ion implantation technology to improve the shape factor of a ladder-type SAW RF filters for mobile communication systems. The improvement of the shape factor was confirmed experimentally. However we found that the SAW phase velocity is decreased by ion implantation. To stabilize and recover the SAW phase velocity, several annealing conditions were investigated. At the annealing condition of over 450/spl deg/C/spl times/1 hour, SAW phase velocity was recovered to almost the same as the initial velocity. In the past, the shape factor values of ladder-type SAW filters using a LiTaO/sub 3/ substrate have been almost 1.7. The ion implantation technology has been applied to a PDC (personal digital cellular) -1.5 GHz SAW band pass filter using a LiTaO/sub 3/ substrate. We have obtained the shape factor value of 1.4 under the following conditions; ion: double charge Ar/sup ++/, dose: 5/spl times/10/sup 13//cm/sup 2/, acceleration voltage: 180 keV.
Starting Page	113
Ending Page	116
File Size	209626
Page Count	4
File Format	PDF
ISBN	0780329406
ISSN	10510117
DOI	10.1109/ULTSYM.1995.495552
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	1995-11-07
Publisher Place	USA
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Surface acoustic waves Radio frequency Shape Ion implantation Annealing Paper technology Mobile communication SAW filters Band pass filters Argon
Content Type	Text
Resource Type	Article

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