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Content Provider | IEEE Xplore Digital Library |
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Author | Dongyean Oh Seungchul Lee Changsub Lee Jaihyuk Song Woonkyung Lee Jeonghyuk Choi |
Copyright Year | 2008 |
Description | Author affiliation: Flash Memory Bus., Samsung Electron. Co., Ltd., Yongin (Dongyean Oh; Seungchul Lee; Changsub Lee; Jaihyuk Song; Woonkyung Lee; Jeonghyuk Choi) |
Abstract | We have investigated a new program disturb phenomenon by DIBL (drain-induced barrier lowering) in MLC NAND Flash device. It is found that lower programmed state cell shows large DIBL effect and its BVdss measurement results in unwanted programming of nearby erased state cells. It is attributed to punch-through leakage of programmed state cell during BVdss measurement. Electrons from this leakage are accelerated by high drain bias, which leads to hot carrier programming. The results indicate that excessive boosted channel potential by local self-boosting scheme creates 'DIBL induced program disturb' by punch-through of channel cut-off cell. This paper suggests that excessive boosted channel potential should be controlled in short channel device for high density MLC NAND Flash operation. |
Starting Page | 5 |
Ending Page | 7 |
File Size | 527789 |
Page Count | 3 |
File Format | |
ISBN | 9781424415465 |
DOI | 10.1109/NVSMW.2008.7 |
Language | English |
Publisher | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Publisher Date | 2008-05-18 |
Publisher Place | France |
Access Restriction | Subscribed |
Rights Holder | Institute of Electrical and Electronics Engineers, Inc. (IEEE) |
Subject Keyword | Electrons Acceleration Hot carrier injection Flash memory Hot carriers Variable structure systems Leakage current Threshold voltage |
Content Type | Text |
Resource Type | Article |
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