NDLI: Intelligent temperature control strate for LiTaO3 thin film deposition process

Content Provider	IEEE Xplore Digital Library
Author	Deyin Zhang Dagui Huang Yanqiu He
Copyright Year	2004
Abstract	Temperature is a key parameter of Lithium tantalate $(LiTa0_{3})$ thin film deposition process by metal `organic chemical vapor deposition (MOCVD) because reactor chamber of MOCVD is with properties of a large temperature lag, a big time delay, nonlinear, and a large heat inertia. In this paper, an intelligent temperature control strategy for LiTa03 thin films deposition process is presented and relation between temperature and process is discussed in details. The control strategy is implemented by design of a hybrid temperature control system with Proportional (P), Fuzzy and PID controller. The bumpless switch between two of the three controllers is a key question and has been solved through using fuzzy switch rules. The simulation results show, compared to those of a conventional one, that new temperature control system has a small overshoot, strong robustness, great anti-interference ability and fine temperature tracking ability. The experimental results also attest high resolution of M.2K at stable stage of temperature control is obtained relatively to the maximal temperature of 1373 K.
Starting Page	339
Ending Page	344
File Size	571682
Page Count	6
File Format	PDF
ISBN	0780387481
DOI	10.1109/ICIMA.2004.1384216
Language	English
Publisher	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Publisher Date	2004-08-26
Publisher Place	China
Access Restriction	Subscribed
Rights Holder	Institute of Electrical and Electronics Engineers, Inc. (IEEE)
Subject Keyword	Intelligent control Temperature control Sputtering MOCVD Switches Substrates Control systems Transistors Ferroelectric materials Crystallization
Content Type	Text
Resource Type	Article

Sl.	Authority	Responsibilities	Communication Details
1	Ministry of Education (GoI), Department of Higher Education	Sanctioning Authority	https://www.education.gov.in/ict-initiatives
2	Indian Institute of Technology Kharagpur	Host Institute of the Project: The host institute of the project is responsible for providing infrastructure support and hosting the project	https://www.iitkgp.ac.in
3	National Digital Library of India Office, Indian Institute of Technology Kharagpur	The administrative and infrastructural headquarters of the project	Dr. B. Sutradhar bsutra@ndl.gov.in
4	Project PI / Joint PI	Principal Investigator and Joint Principal Investigators of the project	Dr. B. Sutradhar bsutra@ndl.gov.in Prof. Saswat Chakrabarti will be added soon
5	Website/Portal (Helpdesk)	Queries regarding NDLI and its services	support@ndl.gov.in
6	Contents and Copyright Issues	Queries related to content curation and copyright issues	content@ndl.gov.in
7	National Digital Library of India Club (NDLI Club)	Queries related to NDLI Club formation, support, user awareness program, seminar/symposium, collaboration, social media, promotion, and outreach	clubsupport@ndl.gov.in
8	Digital Preservation Centre (DPC)	Assistance with digitizing and archiving copyright-free printed books	dpc@ndl.gov.in
9	IDR Setup or Support	Queries related to establishment and support of Institutional Digital Repository (IDR) and IDR workshops	idr@ndl.gov.in

Graphite thin film formation by chemical vapor deposition

MOCVD growth and characterization of Pb-based ferroelectric thin films

Towards high performing ferroelectric thin films

Low temperature MOCVD of BST thin film for high density DRAMs

Preparation of Ir-based thin film electrodes by MOCVD

Polysilicon thin-film transistors fabricated from laser-processed sputtered-silicon films

Amorphous silicon deposition temperature optimization on advanced polysilicon thin-film formation using metal-induced lateral crystallization technology

Large-Area ACTFEL Device Prepared by Metalorganic Chemical Vapor Deposition

Compositional control of ferroelectric Pb(Zr,Ti)O/sub 3/ thin films by reactive sputtering and MOCVD

Intelligent temperature control strate for LiTaO3 thin film deposition process

Similar Documents

Graphite thin film formation by chemical vapor deposition

MOCVD growth and characterization of Pb-based ferroelectric thin films

Towards high performing ferroelectric thin films

Low temperature MOCVD of BST thin film for high density DRAMs

Preparation of Ir-based thin film electrodes by MOCVD

Polysilicon thin-film transistors fabricated from laser-processed sputtered-silicon films

Amorphous silicon deposition temperature optimization on advanced polysilicon thin-film formation using metal-induced lateral crystallization technology

Large-Area ACTFEL Device Prepared by Metalorganic Chemical Vapor Deposition

Compositional control of ferroelectric Pb(Zr,Ti)O/sub 3/ thin films by reactive sputtering and MOCVD

Intelligent temperature control strate for LiTaO3 thin film deposition process